Invention Grant
- Patent Title: Symmetric VHF source for a plasma reactor
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Application No.: US17353668Application Date: 2021-06-21
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Publication No.: US11587766B2Publication Date: 2023-02-21
- Inventor: Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C23C16/00 ; H01J37/32
Abstract:
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Public/Granted literature
- US20210313147A1 SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR Public/Granted day:2021-10-07
Information query
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