Invention Grant
- Patent Title: Chemical solution evaporation device and substrate processing device including the same
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Application No.: US17239644Application Date: 2021-04-25
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Publication No.: US11590460B2Publication Date: 2023-02-28
- Inventor: Wonguk Seo , Sungyong Park , Hongju Kim , Ansook Sul , Seok Heo , Yinghu Xu
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Volentine, Whitt & Francos, PLLC
- Priority: KR10-2020-0089861 20200720
- Main IPC: B01F23/10
- IPC: B01F23/10 ; B01F23/231 ; B01F101/56

Abstract:
A chemical solution vaporization device includes a chemical solution tank including chemical solution vaporization rooms, a chemical solution sensing room, and a chemical solution supply room. A first internal wall separating the plurality of chemical solution vaporization rooms from each other includes a first opening at a lower portion thereof. A second internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution supply room includes a second opening at a lower portion thereof. A third internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution sensing room includes a third opening at a lower portion thereof. And a lower portion of a fourth internal wall separating the chemical solution sensing room from the chemical solution supply room is combined with the lower wall.
Public/Granted literature
- US20220016580A1 CHEMICAL SOLUTION EVAPORATION DEVICE AND SUBSTRATE PROCESSING DEVICE INCLUDING THE SAME Public/Granted day:2022-01-20
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