- 专利标题： Dental photocurable composition containing high soluble photoacid generator
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申请号： US17201165申请日： 2021-03-15
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公开(公告)号： US11622917B2公开(公告)日： 2023-04-11
- 发明人: Kenzo Yamamoto , Daisuke Hara , Shunsuke Miyata
- 申请人： SHOFU INC.
- 申请人地址： JP Kyoto
- 专利权人： SHOFU INC.
- 当前专利权人： SHOFU INC.
- 当前专利权人地址： JP Kyoto
- 代理机构： Wenderoth, Lind & Ponack, L.L.P.
- 优先权： JPJP2021-40033 20210312,JPJP2021-40037 20210312,JPJP2021-40039 20210312,JPJP2021-40040 20210312
- 主分类号： C08F2/46
- IPC分类号： C08F2/46 ; C08F2/50 ; C08G61/04 ; A61K6/62 ; A61K6/71 ; A61K6/78 ; A61K6/30 ; A61K6/831 ; A61K6/887 ; A61K6/61 ; C08F220/28 ; C08F220/32 ; C08K5/00 ; C08K5/08 ; C08K5/14 ; C08K5/17
摘要：
To provide a dental photocurable composition which can exhibit excellent mechanical characteristics even after returning from a low temperature to room temperature.
To provide a dental photocurable composition, comprising (A) polymerizable monomer, (B) photosensitizer, (C) photoacid generator and (D) photopolymerization accelerator and the (C) photoacid generator may include only (C-1) iodonium salt-based compound of an anion having log S of −4 or less.
To provide a dental photocurable composition, comprising (A) polymerizable monomer, (B) photosensitizer, (C) photoacid generator and (D) photopolymerization accelerator and the (C) photoacid generator may include only (C-1) iodonium salt-based compound of an anion having log S of −4 or less.
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