- 专利标题： Lithographic apparatus and method
-
申请号： US17698100申请日： 2022-03-18
-
公开(公告)号： US11630399B2公开(公告)日： 2023-04-18
- 发明人: Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
公开/授权文献
- US20220206400A1 LITHOGRAPHIC APPARATUS AND METHOD 公开/授权日：2022-06-30
信息查询
IPC分类:
