公开(公告)号：US10191377B2

公开(公告)日：2019-01-29

申请号：US15482526

申请日：2017-04-07

申请人： ASML NETHERLANDS B.V.

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendricus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

IPC分类号： G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  H01L21/67

摘要： An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

公开(公告)号：US09971252B2

公开(公告)日：2018-05-15

申请号：US15681679

申请日：2017-08-21

申请人： ASML NETHERLANDS B.V.

发明人： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/52 ,  G03B27/58 ,  H02K41/02 ,  G03F7/20 ,  H01L21/687

CPC分类号： G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：USRE48668E1

公开(公告)日：2021-08-03

申请号：US15711901

申请日：2017-09-21

申请人： ASML NETHERLANDS B.V.

发明人： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Johan Gertrudis Cornelis Kunnen ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/52 ,  G01K13/00 ,  G03F7/20 ,  G03B27/42

摘要： A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.

公开(公告)号：US10747126B2

公开(公告)日：2020-08-18

申请号：US16437760

申请日：2019-06-11

申请人： ASML NETHERLANDS B.V.

发明人： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC分类号： G03F7/20 ,  H01L21/68 ,  H01L21/687

摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US10324382B2

公开(公告)日：2019-06-18

申请号：US15958714

申请日：2018-04-20

申请人： ASML NETHERLANDS B.V.

发明人： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC分类号： G03F7/20 ,  H01L21/68 ,  H01L21/687

摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US10281830B2

公开(公告)日：2019-05-07

申请号：US15742179

申请日：2016-06-17

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Laurentius Johannes Adrianus Van Bokhoven ,  Christopher Charles Ward ,  Marc Léon Van Der Gaag ,  Johan Gertrudis Cornelis Kunnen

IPC分类号： G03F7/20

摘要： A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.

公开(公告)号：US11630399B2

公开(公告)日：2023-04-18

申请号：US17698100

申请日：2022-03-18

申请人： ASML NETHERLANDS B.V.

发明人： Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC分类号： G03F7/20

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US11300890B2

公开(公告)日：2022-04-12

申请号：US16722924

申请日：2019-12-20

申请人： ASML NETHERLANDS B.V.

发明人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC分类号： G03F7/20

摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

公开(公告)号：US10203611B2

公开(公告)日：2019-02-12

申请号：US15818232

申请日：2017-11-20

申请人： ASML NETHERLANDS B.V.

发明人： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC分类号： G03F7/20

摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US09939738B2

公开(公告)日：2018-04-10

申请号：US15329536

申请日：2015-07-16

申请人： ASML Netherlands B.V.

发明人： Adrianus Hendrik Koevoets ,  Christianus Wilhelmus Johannes Berendsen ,  Rogier Hendrikus Magdalena Cortie ,  Jim Vincent Overkamp ,  Patricius Jacobus Neefs ,  Putra Saputra ,  Ruud Hendrikus Martinus Johannes Bloks ,  Michael Johannes Hendrika Wilhelmina Renders ,  Johan Gertrudis Cornelis Kunnen ,  Thibault Simon Mathieu Laurent

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70875

摘要： A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.