Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US17011006Application Date: 2020-09-03
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Publication No.: US11631683B2Publication Date: 2023-04-18
- Inventor: Naoya Yoshimura , Keisuke Nakatsuka
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2020-051004 20200323
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11519 ; H01L27/11565 ; G11C16/04 ; H01L27/11556

Abstract:
A semiconductor storage device includes first conductive layers stacked in a first direction and extend in a second direction; second conductive layers stacked in the first direction and extend in the second direction; third conductive layers that are electrically connected to the first conductive layers and the second conductive layers and stacked in the first direction; a first insulating layer and a second insulating layer sandwich the first conductive layer; a third insulating layer and a fourth insulating layer sandwich the second conductive layer; first pillars arranged in the second direction in the first insulating layer with a first distance; and second pillars arranged in the second direction in the second insulating layer with the first distance. Each of the second pillars is displaced from a corresponding one of the first pillars by a second distance that is shorter than a half of the first distance in the second direction.
Public/Granted literature
- US20210296331A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2021-09-23
Information query
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