- 专利标题: Anti-corrosion conductive film and pulse bias alternation-based magnetron sputtering deposition method and application thereof
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申请号: US16964113申请日: 2019-01-21
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公开(公告)号: US11634808B2公开(公告)日: 2023-04-25
- 发明人: Peiyun Yi , Weixin Zhang , Linfa Peng , Xinmin Lai
- 申请人: Shanghai Jiaotong University
- 申请人地址: CN Shanghai
- 专利权人: Shanghai Jiaotong University
- 当前专利权人: Shanghai Jiaotong University
- 当前专利权人地址: CN Shanghai
- 代理机构: Hamre, Schumann, Mueller & Larson, P.C.
- 优先权: CN201810069493.2 20180124
- 国际申请: PCT/CN2019/072479 WO 20190121
- 国际公布: WO2019/144853 WO 20190801
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; C23C14/02 ; C23C14/06 ; C23C14/35 ; H01M8/0208 ; H01M8/0213 ; H01M8/0228 ; H05K9/00
摘要:
The disclosure provides an anti-corrosion conductive film and methods of making and using thereof. The anti-corrosion conductive film is formed by sequentially forming an anti-corrosion protective layer, a stress transition layer and a conducting layer on the surface of a substrate by deposition through a high-low pulse bias alternation method. The anti-corrosion conductive film is a nano-multilayer anti-corrosion conductive film exhibiting excellent corrosion resistance and conductivity. The anti-corrosion conductive film has great application prospects in the fields of metal polar plates of fuel cells, ground grid equipment of power transmission lines, and the like.
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