发明授权
- 专利标题: Method, system, and device for storage and delivery of process gas from a substrate
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申请号: US16890875申请日: 2020-06-02
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公开(公告)号: US11634816B2公开(公告)日: 2023-04-25
- 发明人: Richard D. Blethen , Jeffrey J. Spiegelman , Russell J. Holmes , Daniel Alvarez, Jr. , Jian Yang , Ericca Lynne Speed
- 申请人: RASIRC, Inc.
- 申请人地址: US CA San Diego
- 专利权人: RASIRC, Inc.
- 当前专利权人: RASIRC, Inc.
- 当前专利权人地址: US CA San Diego
- 代理机构: Wagenknecht IP Law Group PC
- 主分类号: F17C11/00
- IPC分类号: F17C11/00 ; C23C16/455 ; C09K13/00 ; C08K5/14 ; C08L27/18 ; C08L71/02
摘要:
Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.