Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17129552Application Date: 2020-12-21
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Publication No.: US11646366B2Publication Date: 2023-05-09
- Inventor: Kozo Makiyama , Shirou Ozaki , Atsushi Yamada , Junji Kotani
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Agency: ArentFox Schiff LLP
- Priority: JP 2020010323 2020.01.24
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/778

Abstract:
A disclosed semiconductor device includes an electron transit layer; an electron supply layer disposed above the electron transit layer; a source electrode, a drain electrode, and a gate electrode, the source electrode, the drain electrode, and the gate electrode being disposed on the electron supply layer; a first capping layer disposed on the electron supply layer between the gate electrode and the drain electrode; and a negative charge generation layer disposed on the first capping layer, the negative charge generation layer being configured to generate a negative charge.
Public/Granted literature
- US20210234031A1 SEMICONDUCTOR DEVICE Public/Granted day:2021-07-29
Information query
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