Invention Grant
- Patent Title: Memory device
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Application No.: US17443586Application Date: 2021-07-27
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Publication No.: US11651818B2Publication Date: 2023-05-16
- Inventor: Ryu Ogiwara , Daisaburo Takashima , Takahiko Iizuka
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz & Volek PC
- Priority: JP 2020126450 2020.07.27
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C13/00 ; G11C16/34 ; G11C16/04

Abstract:
According to one embodiment, a memory device includes: a variable resistance memory region; a semiconductor layer; an insulating layer; first and second word lines; and a first select gate line. When information stored in the first memory cell is read, or when information is written into the first memory cell, after a voltage of the first select gate line is set to a first voltage and voltages of the first and second word lines are set to a second voltage, the voltage of the first select gate line is increased from the first voltage to a third voltage. After the voltage of the first select gate line is increased to at least the second voltage, the voltage of the first word line is decreased from the second voltage to the first voltage, and the voltage of the second word line is increased from the second voltage to a fourth voltage.
Public/Granted literature
- US20220028452A1 MEMORY DEVICE Public/Granted day:2022-01-27
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