- Patent Title: Integrated assemblies and methods of forming integrated assemblies
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Application No.: US17061852Application Date: 2020-10-02
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Publication No.: US11652108B2Publication Date: 2023-05-16
- Inventor: Scott E. Sills , Yi Fang Lee , Kevin J. Torek
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L27/00 ; H01L29/00 ; H01L27/12 ; H01L29/786 ; H01L21/768

Abstract:
Some embodiments include an integrated assembly which includes a base structure. The base structure includes a series of conductive structures which extend along a first direction. The conductive structures have steps which alternate with recessed regions along the first direction. Pillars of semiconductor material are over the steps. The semiconductor material includes at least one element selected from Group 13 of the periodic table in combination with at least one element selected from Group 16 of the periodic table. The semiconductor material may be semiconductor oxide in some applications. Some embodiments include methods of forming integrated assemblies.
Public/Granted literature
- US20220109008A1 Integrated Assemblies and Methods of Forming Integrated Assemblies Public/Granted day:2022-04-07
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