- Patent Title: Composition, film, lens, solid state imaging element, and compounds
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Application No.: US16713234Application Date: 2019-12-13
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Publication No.: US11656384B2Publication Date: 2023-05-23
- Inventor: Yushi Kaneko , Yoshinori Taguchi , Hirotaka Takishita , Masahiro Mori , Yasuhiro Sawamura
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 17117168 2017.06.14
- Main IPC: C07D251/70
- IPC: C07D251/70 ; G02B1/04 ; C07C233/65 ; C07C257/06 ; C07C311/21 ; C07C323/47 ; C07D209/60 ; C07D209/88 ; C07D251/52 ; C07D401/12 ; C07D417/12 ; C07D491/048 ; C07D513/04 ; H04N25/00

Abstract:
An object of the present invention is to provide a composition capable of forming a film having a high refractive index and excellent exterior characteristics. Another object of the present invention is to provide a film, a lens, and a solid-state imaging element in which the composition is used. Still another object of the present invention is to provide novel compounds.
The composition according to an embodiment of the present invention contains a compound represented by General Formula (I), a solvent, and a resin, in which a solubility of the compound represented by General Formula (I) in the solvent is less than 0.5% by mass at 25° C., and a maximum absorption wavelength of the compound represented by General Formula (I) at a wavelength range of 300 to 800 nm is equal to or shorter than 450 nm.
AB-C)n (I)
The composition according to an embodiment of the present invention contains a compound represented by General Formula (I), a solvent, and a resin, in which a solubility of the compound represented by General Formula (I) in the solvent is less than 0.5% by mass at 25° C., and a maximum absorption wavelength of the compound represented by General Formula (I) at a wavelength range of 300 to 800 nm is equal to or shorter than 450 nm.
AB-C)n (I)
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