Invention Grant
- Patent Title: One-time programmable memory device including anti-fuse element and manufacturing method thereof
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Application No.: US17393621Application Date: 2021-08-04
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Publication No.: US11665890B2Publication Date: 2023-05-30
- Inventor: Chiung-Ting Ou , Ming-Yih Wang , Jian-Hong Lin
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L27/112
- IPC: H01L27/112 ; H01L23/48

Abstract:
A memory device includes a transistor, an anti-fuse element, a first gate via, a second gate via, and a bit line. The transistor includes a fin structure and a first gate structure across the fin structure. The anti-fuse element includes the fin structure and a second gate structure across the fin structure. The first gate via is connected to the first gate structure of the transistor and is spaced apart from the fin structure in a top view. The second gate via is connected to the second gate structure of the anti-fuse element and is directly above the fin structure. The bit line is connected to the fin structure and the transistor.
Public/Granted literature
- US20210366918A1 ONE-TIME PROGRAMMABLE MEMORY DEVICE INCLUDING ANTI-FUSE ELEMENT AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-11-25
Information query
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