Invention Grant
- Patent Title: Digital exposure apparatus and exposure method
-
Application No.: US17214678Application Date: 2021-03-26
-
Publication No.: US11669016B2Publication Date: 2023-06-06
- Inventor: Jing Feng , Xinglong Luan , Zhichong Wang , Peng Liu , Guangcai Yuan
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: McCoy Russell LLP
- Priority: CN 2011195247.5 2020.10.30
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B17/02 ; G02B3/00 ; G02B26/08 ; G02B17/06

Abstract:
A digital exposure apparatus includes a lens array, the lens array at least including a first lens unit and a second lens unit, a light transposition assembly arranged on an exit light path of the second lens unit, and the light transposition assembly being used for controlling a light exiting from the second lens unit to be transposed with respect to an exposure direction of the digital exposure apparatus. When the digital exposure apparatus is used for exposure, a light passing through the first lens unit and a light penetrating through the second lens unit are needed to expose the same position for multiple times.
Public/Granted literature
- US20220137515A1 DIGITAL EXPOSURE APPARATUS AND EXPOSURE METHOD Public/Granted day:2022-05-05
Information query
IPC分类: