Invention Grant
- Patent Title: Apparatus using charged particle beams
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Application No.: US16753285Application Date: 2018-10-02
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Publication No.: US11670477B2Publication Date: 2023-06-06
- Inventor: Xuerang Hu , Xuedong Liu , Weiming Ren , Zhong-wei Chen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- International Application: PCT/EP2018/076707 2018.10.02
- International Announcement: WO2019/068666A 2019.04.11
- Date entered country: 2020-04-02
- Main IPC: H01J37/09
- IPC: H01J37/09 ; H01J37/12 ; H01J37/14 ; H01J37/147 ; H01J37/153 ; H01J37/28

Abstract:
A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.
Public/Granted literature
- US20200303155A1 AN APPARATUS USING CHARGED PARTICLE BEAMS Public/Granted day:2020-09-24
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