公开(公告)号：US12230469B2

公开(公告)日：2025-02-18

申请号：US17566518

申请日：2021-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus Mangnus ,  Maikel Robert Goosen

IPC: H01J37/153 ,  H01J37/28

Abstract: Disclosed among other aspects is a charged particle inspection system including a phaseplate configured and arranged to modify the local phase of charged particles in a beam to reduce the effects of lens aberrations. The phaseplate is made up of an array of apertures with the voltage and/or a degree of obscuration of the apertures being controlled individually or in groups.

公开(公告)号：US12198891B2

公开(公告)日：2025-01-14

申请号：US17811985

申请日：2022-07-12

Applicant: NuFlare Technology, Inc.

Inventor： Taku Yamada

IPC: H01J37/147 ,  G03F7/20 ,  H01J37/153 ,  H01J37/304 ,  H01J37/317 ,  H01L21/027

Abstract: A difference between a calculated amount of drift and an actual amount of drift is reduced. According to one aspect of the present invention, a charged particle beam writing apparatus includes a deflector adjusting an irradiation position of the charged particle beam with respect to a substrate placed on a stage, a shot data generator generating shot data from writing data, the shot data including a shot position and beam ON and OFF times for each shot, a drift corrector referring to a plurality of pieces of the generated shot data, calculating an amount of drift of the irradiation position of the charged particle beam with which the substrate is irradiated, and generating correction information for correcting an irradiation position deviation based on the amount of drift, a deflection controller controlling a deflection amount achieved by the deflector based on the shot data and the correction information, and a dummy irradiation instructor instructing execution of dummy irradiation in a writing process to irradiate with the charged particle beam in a predetermined irradiation amount at a position different from the substrate on the stage.

公开(公告)号：US12176179B2

公开(公告)日：2024-12-24

申请号：US18474982

申请日：2023-09-26

Applicant: FEI Company

Inventor： Maarten Bischoff ,  Peter Christiaan Tiemeijer ,  Tjerk Gerrit Spanjer ,  Stan Johan Pieter Konings

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28

Abstract: A method for reducing throughput time in a sample image acquisition session in transmission electron microscopy comprises: providing an electron microscope comprising a sample component, a beam generator, an adjusting component, and a filtering component; securing a sample by using the sample component; generating an electron beam by using the beam generator; generating an image beam by directing the beam to the sample component; adjusting at least one of the beam and the image beam by using the adjusting component to obtain at least one modified image beam, wherein the adjusting is performed in such a way, that off-axial aberration of the modified image beam is minimized; and filtering the modified image beam via the filtering component to reduce resolution-deteriorating effect of chromatic aberration on the modified image beam resulting from the adjusting of the at least one of the beam and the image beam.

公开(公告)号：US20240371597A1

公开(公告)日：2024-11-07

申请号：US18654627

申请日：2024-05-03

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Juergen Pommerenke

IPC: H01J37/153 ,  H01J37/141

Abstract: A multipole element for creating a magnetic multipole field or for creating an electric-magnetic multipole field for a particle beam system such as a scanning electron microscope, for example, comprises: a tube surrounding a central axis of the multipole element; an external space assembly arranged outside of the tube and a vacuum space assembly arranged within the tube. The external space assembly comprises: a magnetically conductive circumferential pole piece surrounding the tube; a plurality of magnetically conductive supports arranged so as to be distributed around the central axis and extending from the circumferential pole piece up to an outer wall surface of the tube; and a plurality of coils. The vacuum space assembly comprises a plurality of magnetically conductive pole pieces arranged so as to be distributed around the central axis and extending from the tube in the direction of the central axis.

公开(公告)号：US20240355577A1

公开(公告)日：2024-10-24

申请号：US18683071

申请日：2022-08-11

Applicant: ELDICO SCIENTIFIC AG

Inventor： Gunther STEINFELD ,  Harald NIEBEL ,  Christiaan VAN DEN BERG ,  Alexander VAN VEEN ,  Tomi TUOHIMAA

IPC: H01J37/21 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26 ,  H01J37/295

CPC classification number: H01J37/21 ,  H01J37/14 ,  H01J37/1474 ,  H01J37/153 ,  H01J37/265 ,  H01J37/2955 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/1532

Abstract: A charged-particle beam device for charged-particle crystallography of a crystalline sample comprises a charged-particle source for generating a charged-particle beam to be radiated onto a sample and a charged-particle-optical system downstream the charged-particle source, which is configured to form in a diffraction mode a substantially parallel charged-particle beam at a predefined sample position and in an imaging mode a focused charged-particle beam having a focus at the predefined sample position. The charged-particle-optical system comprises a charged-particle zoom lens system consisting of a first magnetic lens, a second magnetic lens downstream the first magnetic lens and a third magnetic lens downstream the second magnetic lens, wherein at least the second magnetic lens, preferably each one of the first, the second and the third magnetic lens has a variable focal length. The charged-particle-optical system further comprises a single beam limiting aperture with a fixed aperture diameter arranged at a fixed position between the second magnetic lens and the third magnetic lens for limiting the diameter of the charged-particle beam at the sample position. The charged-particle-optical system is configured such that the diameter of the charged-particle beam at the sample position is in a range between 100 nanometer and 1000 nanometer, in particular between 220 nanometer and 250 nanometer, in the diffraction mode, and in a range between 10 nanometer and 200 nanometer in the imaging mode.

公开(公告)号：US12094684B1

公开(公告)日：2024-09-17

申请号：US16532459

申请日：2019-08-05

Applicant: Mochii, Inc.

Inventor： Christopher Su-Yan Own ,  Matthew Francis Murfitt

IPC: H01J37/28 ,  G01N23/2252 ,  H01J37/153 ,  H01J37/285

CPC classification number: H01J37/28 ,  G01N23/2252 ,  H01J37/153 ,  H01J37/285 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2807

Abstract: A compact charged-particle-beam microscope, weighing less than about 50 kg and having a size of less than about 1 m×1 m×1 m, is provided for imaging a sample. The microscope has a vacuum chamber to maintain a low-pressure environment, a stage to hold a sample in the vacuum chamber, a charged-particle beam source to generate a charged-particle beam, charged-particle beam optics to converge the charged-particle beam onto the sample, and one or more beam scanners to scan the charged-particle beam across the sample. A charged-particle detector is provided to detect charged-particle radiation emanating from the sample and generate a corresponding charged-particle-detection signal. At least one energy dispersive x-ray spectrometer (EDS) is provided to detect x-rays emanating from the sample and generate a corresponding x-ray-detection signal. A controller analyzes the charged-particle-detection signal and the x-ray-detection signal to generate an image of the sample and a histogram of x-ray energies for at least a portion of the sample.

公开(公告)号：US20240282547A1

公开(公告)日：2024-08-22

申请号：US18647061

申请日：2024-04-26

Applicant: NuFlare Technology, Inc.

Inventor： Koichi ISHII ,  Atsushi ANDO

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J37/153 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/3177 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/2448 ,  H01J2237/2817 ,  H01J2237/31776

Abstract: A multi-electron beam image acquisition apparatus includes a multiple primary electron beams forming device to form multiple primary electron beams, a first-deflector to scan the multiple-primary electron beams over a target object by deflecting the multiple-primary electron beams, a corrector to correct a beam-array-distribution-shape of multiple-secondary electron beams emitted from the target object irradiated with the multiple-primary electron beams, a second-deflector to deflect the multiple-secondary electron beams whose beam-array-distribution-shape has been corrected, a detector to detect the deflected multiple-secondary electron beams, and a deflection control circuit to control applying, to the second-deflector, a superimposed potential obtained by superimposing a deflection potential which cancels out a position movement of the multiple-secondary electron beams moved along with scanning the multiple-primary electron beams on a correction potential which corrects a distortion being generated due to correcting the beam-array-distribution-shape of the multiple-secondary electron beams and being dependent on a deflection amount for scanning.

公开(公告)号：US20240274396A1

公开(公告)日：2024-08-15

申请号：US18110284

申请日：2023-02-15

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： John Breuer ,  Dominik Patrick Ehberger ,  Kathrin Mohler ,  Ivo Liska

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/1472 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/24514

Abstract: A method of forming a multipole device (100) for influencing an electron beam (11) is provided. The method is carried out in an electron beam apparatus (200) that comprises an aperture body (110) having at least one aperture opening (112). The method comprises directing the electron beam (11) onto two or more surface portions of the aperture body (110) on two or more sides of the at least one aperture opening (112) to generate an electron beam-induced deposition pattern (120) configured to act as a multipole in a charged state, particularly configured to act as a quadrupole, a hexapole and/or an octupole. The electron beam-induced deposition pattern (120) can be an electron beam-induced carbon or carbonaceous pattern. Further provided are methods of influencing an electron beam in an electron beam apparatus, particularly with a multipole device as described herein. Further provided is a multipole device for influencing an electron beam in an electron beam apparatus in a predetermined manner.

公开(公告)号：US20240242924A1

公开(公告)日：2024-07-18

申请号：US18560013

申请日：2022-02-25

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Michinobu MIZUMURA

IPC: H01J37/153 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

Abstract: A condenser lens works to process an ion beam into a collimated form. An electrical aperture unit is disposed between the condenser lens and the objective lens. The electrical aperture unit works to alter an area through which the ion beam, as processed by the condenser lens, passes, thereby controlling a diameter of the ion beam. A plurality of beam shielding plate units are provided each of which includes a pair of beam shielding plates which are diametrically opposed to each other across the ion beam which has passed through the condenser lens. The beam shielding plates are movable in a direction perpendicular to an optical axis of the ion beam. The beam shielding plate units are arranged around the ion beam to define a diameter of the ion beam passing therethrough.

公开(公告)号：US20240242922A1

公开(公告)日：2024-07-18

申请号：US18493961

申请日：2023-10-25

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA ,  Haruyuki NOMURA

IPC: H01J37/153 ,  H01J37/04 ,  H01J37/09 ,  H01J37/145 ,  H01J37/317

CPC classification number: H01J37/153 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/3174 ,  H01J2237/04735 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through the limiting aperture member, three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied, the electric field control electrode generating an electric field between the substrate and the electric field control electrode. The two or more-stage objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the multi charged particle beam. The three or more correction lenses are placed upstream of a lens magnetic field of the second objective lens in the travel direction of the multi charged particle beam.