Invention Grant
- Patent Title: Selecting a set of locations associated with a measurement or feature on a substrate
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Application No.: US17686586Application Date: 2022-03-04
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Publication No.: US11681231B2Publication Date: 2023-06-20
- Inventor: Pierluigi Frisco , Svetla Petrova Matova , Jochem Sebastiaan Wildenberg
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP 193903 2016.10.14 EP 160587 2017.03.13
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00 ; G03F7/00

Abstract:
A method for selecting an optimal set of locations for a measurement or feature on a substrate, the method includes: defining a first candidate solution of locations, defining a second candidate solution with locations based on modification of a coordinate in a solution domain of the first candidate solution, and selecting the first and/or second candidate solution as the optimal solution according to a constraint associated with the substrate.
Public/Granted literature
- US20220187714A1 SELECTING A SET OF LOCATIONS ASSOCIATED WITH A MEASUREMENT OR FEATURE ON A SUBSTRATE Public/Granted day:2022-06-16
Information query
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