Invention Grant
- Patent Title: Method for optimizing a patterning device pattern
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Application No.: US16336485Application Date: 2017-10-23
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Publication No.: US11681849B2Publication Date: 2023-06-20
- Inventor: Duan-Fu Stephen Hsu , Xiaoyang Jason Li
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2017/076972 2017.10.23
- International Announcement: WO2018/077787A 2018.05.03
- Date entered country: 2019-03-26
- Main IPC: G06F30/39
- IPC: G06F30/39 ; G06F30/398 ; G03F7/00

Abstract:
A method for optimizing a patterning device pattern, the method including obtaining an initial design pattern having a plurality of polygons, causing at least some of the polygons to be effectively connected with each other, placing evaluation features outside the boundaries of the polygons, and creating a patterning device pattern spanning across the connected polygons based on the evaluation features.
Public/Granted literature
- US20210232748A1 METHOD FOR OPTIMIZING A PATTERNING DEVICE PATTERN Public/Granted day:2021-07-29
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