Invention Grant
- Patent Title: Electron emitter and method of fabricating same
-
Application No.: US17549854Application Date: 2021-12-13
-
Publication No.: US11688579B2Publication Date: 2023-06-27
- Inventor: Juying Dou , Zheng Fan , Tzu-Yi Kuo , Zhong-wei Chen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: H01J37/073
- IPC: H01J37/073 ; H01J37/065 ; H01J1/304 ; H01J1/14 ; H01J9/02 ; H01J9/04 ; H01J37/26

Abstract:
Electron emitters and methods of fabricating the electron emitters are disclosed. According to certain embodiments, an electron emitter includes a tip with a planar region having a diameter in a range of approximately (0.05-10) micrometers. The electron emitter tip is configured to release field emission electrons. The electron emitter further includes a work-function-lowering material coated on the tip.
Public/Granted literature
- US20220189725A1 ELECTRON EMITTER AND METHOD OF FABRICATING SAME Public/Granted day:2022-06-16
Information query