Invention Grant
- Patent Title: Integrated circuit devices including vertical field-effect transistors
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Application No.: US16947692Application Date: 2020-08-13
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Publication No.: US11688737B2Publication Date: 2023-06-27
- Inventor: Jung Ho Do , Seung Hyun Song
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Main IPC: H01L27/092
- IPC: H01L27/092 ; H01L29/78 ; H01L29/423 ; H01L29/417 ; H01L21/8234 ; H10B63/00

Abstract:
Integrated circuit devices including standard cells are provided. The standard cells may include a first vertical field effect transistor (VFET) including a first channel region and having a first conductivity type and a second VFET including a second channel region and having a second conductivity type that is different from the first conductivity type. Each of the first channel region and the second channel region may extend longitudinally in a first horizontal direction, and the first channel region may be spaced apart from the second channel region in a second horizontal direction that is perpendicular to the first horizontal direction.
Public/Granted literature
- US20210242202A1 INTEGRATED CIRCUIT DEVICES INCLUDING VERTICAL FIELD-EFFECT TRANSISTORS Public/Granted day:2021-08-05
Information query
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