Invention Grant
- Patent Title: Field effect-transistor, method for manufacturing same, wireless communication device using same, and product tag
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Application No.: US16630759Application Date: 2018-09-25
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Publication No.: US11690237B2Publication Date: 2023-06-27
- Inventor: Daisuke Sakii , Seiichiro Murase , Junji Wakita
- Applicant: TORAY INDUSTRIES, INC.
- Applicant Address: JP Tokyo
- Assignee: TORAY INDUSTRIES, INC.
- Current Assignee: TORAY INDUSTRIES, INC.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 2017189900 2017.09.29
- International Application: PCT/JP2018/035275 2018.09.25
- International Announcement: WO2019/065561A 2019.04.04
- Date entered country: 2020-01-13
- Main IPC: H10K10/46
- IPC: H10K10/46 ; C08K3/04 ; C08K3/08 ; C08K3/22 ; G06K19/07 ; C08G77/00 ; C08G77/22 ; H01L29/786 ; C08G77/28 ; C08G77/14

Abstract:
A field-effect transistor including at least: a substrate; a source electrode; a drain electrode; a gate electrode; a semiconductor layer in contact with the source electrode and with the drain electrode; and a gate insulating layer insulating between the semiconductor layer and the gate electrode, wherein the semiconductor layer contains a carbon nanotube, and the gate insulating layer contains a polymer having inorganic particles bound thereto. Provided is a field-effect transistor and a method for producing the field-effect transistor, wherein the field-effect transistor causes decreased leak current and furthermore enables a semiconductor solution to be uniformly applied.
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