Invention Grant
- Patent Title: Composition for forming hard coating layer, preparation method of hard coating film, and hard coating film prepared using the same
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Application No.: US16537780Application Date: 2019-08-12
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Publication No.: US11692108B2Publication Date: 2023-07-04
- Inventor: Jong Nam Ahn , Byoung Sun Ko , Jin Su Park , Tae Sug Jang , Ho Chul Yoon
- Applicant: SK Innovation Co., Ltd. , SK IE Technology Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: SK Innovation Co., Ltd.,SK ie technology Co., Ltd.
- Current Assignee: SK Innovation Co., Ltd.,SK ie technology Co., Ltd.
- Current Assignee Address: KR Seoul; KR Seoul
- Agency: The Webb Law Firm
- Priority: KR 20180096207 2018.08.17 KR 20190094210 2019.08.02
- Main IPC: C09D163/00
- IPC: C09D163/00 ; C09D183/06 ; C08K3/36 ; C08K9/04

Abstract:
Provided is a composition for forming a hard coating layer, which includes an epoxy siloxane resin, a crosslinking agent including a compound having an alicyclic epoxy group, a thermal initiator including a compound represented by a specific chemical formula, a photoinitiator, a fluorine-substituted (meth)acrylate compound, and silica nanoparticles surface-modified with a fluorine compound, and forms a hard coating layer having excellent hardness and antifouling property and suppressing curling.
Public/Granted literature
Information query
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