Invention Grant
- Patent Title: Oxide thin film transistor, method for manufacturing the same and display device
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Application No.: US17356167Application Date: 2021-06-23
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Publication No.: US11695079B2Publication Date: 2023-07-04
- Inventor: Lizhong Wang , Tianmin Zhou , Hehe Hu , Xiaochun Xu , Nianqi Yao , Dapeng Xue , Shuilang Dong
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: CN 2011170073.7 2020.10.28
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L29/00 ; H01L29/786 ; H01L27/12 ; H01L29/66

Abstract:
An oxide thin film transistor includes: a gate electrode, a metal oxide active layer and a source-drain metal layer, which are on a base substrate. The metal oxide active layer includes a first metal oxide layer and a second metal oxide layer stacked on the first metal oxide layer in a direction away from the base substrate; the first metal oxide layer is a carrier transport layer; the second metal oxide layer is a carrier isolation layer; an electron transfer rate of the carrier transport layer is greater than an electron transfer rate of the carrier isolation layer. The first metal oxide layer includes a primary surface facing toward the base substrate and a primary surface away from the base substrate; the first metal oxide layer further includes a lateral surface around the primary surfaces; the second metal oxide layer covers the lateral surface of the first metal oxide layer.
Public/Granted literature
- US20220131009A1 OXIDE THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE Public/Granted day:2022-04-28
Information query
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