Invention Grant
- Patent Title: Method for manufacturing diamond substrate
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Application No.: US17297635Application Date: 2019-11-27
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Publication No.: US11699587B2Publication Date: 2023-07-11
- Inventor: Ok Hyun Nam , Ui Ho Choi , Geun Ho Yoo
- Applicant: KOREA POLYTECHNIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION
- Applicant Address: KR Siheung-si
- Assignee: KOREA POLYTECHNIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION
- Current Assignee: KOREA POLYTECHNIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION
- Current Assignee Address: KR Siheung-si
- Agency: Lex IP Meister, PLLC
- Priority: KR 20180152579 2018.11.30 KR 20190088718 2019.07.23
- International Application: PCT/KR2019/016511 2019.11.27
- International Announcement: WO2020/111790A 2020.06.04
- Date entered country: 2021-05-27
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
The present invention relates to a method for manufacturing a diamond substrate, and more particularly, to a method of growing diamond after forming a structure of an air gap having a crystal correlation with a lower substrate by heat treatment of a photoresist pattern and an air gap forming film material on a substrate such as sapphire (Al2O3). Through such a method, a process is simplified and the cost is lowered when large-area/large-diameter single crystal diamond is heterogeneously grown, stress due to differences in a lattice constant and a coefficient of thermal expansion between the heterogeneous substrate and diamond is relieved, and an occurrence of defects or cracks is reduced even when a temperature drops, such that a high-quality single crystal diamond substrate may be manufactured and the diamond substrate may be easily self-separated from the heterogeneous substrate.
Public/Granted literature
- US20220285154A1 METHOD FOR MANUFACTURING DIAMOND SUBSTRATE Public/Granted day:2022-09-08
Information query
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