Invention Grant
- Patent Title: Method of fabricating a semiconductor package having redistribution patterns including seed patterns and seed layers
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Application No.: US17741751Application Date: 2022-05-11
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Publication No.: US11705341B2Publication Date: 2023-07-18
- Inventor: Seokhyun Lee , Gwangjae Jeon
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR 20190130111 2019.10.18
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L23/498

Abstract:
Disclosed are redistribution substrates and semiconductor packages including the same. For example, a redistribution substrate including a dielectric pattern, and a first redistribution pattern in the dielectric pattern is provided. The first redistribution pattern may include: a first via part having a first via seed pattern and a first via conductive pattern on the first via seed pattern, and a first wiring part having a first wiring seed pattern and a first wiring conductive pattern, the first wiring part being disposed on the first via part and having a horizontal width that is different from a horizontal width of the first via part. Additionally, the first wiring seed pattern may cover a bottom surface and a sidewall surface of the first wiring conductive pattern, and the first via conductive pattern is directly connected to the first wiring conductive pattern.
Public/Granted literature
- US20220270959A1 REDISTRIBUTION SUBSTRATE AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME Public/Granted day:2022-08-25
Information query
IPC分类: