Invention Grant
- Patent Title: Nanowire structure enhanced for stack deposition
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Application No.: US17326642Application Date: 2021-05-21
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Publication No.: US11705484B2Publication Date: 2023-07-18
- Inventor: Julien El Sabahy , Frédéric Voiron , Paul-Henri Haumesser , Pierre Noe , Guy Parat
- Applicant: Murata Manufacturing Co., Ltd. , COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: JP Nagaokakyo
- Assignee: MURATA MANUFACTURING CO., LTD.,COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: MURATA MANUFACTURING CO., LTD.,COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: JP Nagaokakyo; FR Paris
- Agency: ArentFox Schiff LLP
- Priority: EP 306565 2018.11.23
- Main IPC: H01G4/008
- IPC: H01G4/008 ; H01G4/012 ; H01G4/33 ; B82Y10/00 ; B82Y40/00 ; H01L49/02

Abstract:
A nanowire structure that includes a conductive layer; conductive wires having first ends that contact the conductive layer and second ends that protrude from the conductive layer; and a lateral bridge layer that connects laterally a number of the conductive wires to provide a substantially uniform spacing between the conductive wires.
Public/Granted literature
- US20210280670A1 NANOWIRE STRUCTURE ENHANCED FOR STACK DEPOSITION Public/Granted day:2021-09-09
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