- 专利标题: Cross-point memory array and related fabrication techniques
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申请号: US17174027申请日: 2021-02-11
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公开(公告)号: US11706934B2公开(公告)日: 2023-07-18
- 发明人: Hernan A. Castro , Stephen H. Tang , Stephen W. Russell
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Holland & Hart LLP
- 分案原申请号: US15961547 2018.04.24
- 主分类号: H01L27/24
- IPC分类号: H01L27/24 ; H01L27/11514 ; H01L45/00 ; H01L23/522 ; H01L21/768
摘要:
Methods and apparatuses for a cross-point memory array and related fabrication techniques are described. The fabrication techniques described herein may facilitate concurrently building two or more decks of memory cells disposed in a cross-point architecture. Each deck of memory cells may include a plurality of first access lines (e.g., word lines), a plurality of second access lines (e.g., bit lines), and a memory component at each topological intersection of a first access line and a second access line. The fabrication technique may use a pattern of vias formed at a top layer of a composite stack, which may facilitate building a 3D memory array within the composite stack while using a reduced number of processing steps. The fabrication techniques may also be suitable for forming a socket region where the 3D memory array may be coupled with other components of a memory device.
公开/授权文献
- US11653505B2 Cross-point memory array and related fabrication techniques 公开/授权日:2023-05-16
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