Invention Grant
- Patent Title: Resonator coil having an asymmetrical profile
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Application No.: US17378327Application Date: 2021-07-16
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Publication No.: US11710617B2Publication Date: 2023-07-25
- Inventor: Costel Biloiu , Michael Honan , Robert B. Vopat , David Blahnik , Charles T. Carlson , Frank Sinclair , Paul Murphy
- Applicant: APPLIED Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED Materials, Inc.
- Current Assignee: APPLIED Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: KDW Firm PLLC
- Main IPC: H01J23/18
- IPC: H01J23/18 ; H01J37/30 ; H01J37/317

Abstract:
Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.
Public/Granted literature
- US20210343500A1 RESONATOR COIL HAVING AN ASYMMETRICAL PROFILE Public/Granted day:2021-11-04
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