- Patent Title: Cathodoluminescence focal scans to characterize 3D NAND CH profile
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Application No.: US17574055Application Date: 2022-01-12
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Publication No.: US11713964B1Publication Date: 2023-08-01
- Inventor: David Goldovsky , Ido Almog , Ronny Barnea
- Applicant: Applied Materials Israel Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel Ltd.
- Current Assignee: Applied Materials Israel Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G01B15/04
- IPC: G01B15/04 ; H01J37/285 ; H01J37/244 ; H01J37/28

Abstract:
Disclosed herein is a system for profiling holes in non-opaque samples. The system includes: (i) an e-beam source configured to project an e-beam into an inspection hole in a sample, such that a wall of the inspection hole is struck and a localized electron cloud is produced; (ii) a light sensing infrastructure configured to sense cathodoluminescent light, generated by the electron cloud; and (iii) a computational module configured to analyze the measured signal to obtain the probed depth at which the wall was struck. A lateral offset, and/or orientation, of the e-beam is controllable, so as to allow generating localized electron clouds at each of a plurality of depths inside the inspection hole, and thereby obtain information at least about a two-dimensional geometry of the inspection hole.
Public/Granted literature
- US20230221112A1 CATHODOLUMINESCENCE FOCAL SCANS TO CHARACTERIZE 3D NAND CH PROFILE Public/Granted day:2023-07-13
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