Invention Grant
- Patent Title: Fabrication of a nanochannel for DNA sequencing using electrical plating to achieve electrode gap
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Application No.: US16854607Application Date: 2020-04-21
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Publication No.: US11714061B2Publication Date: 2023-08-01
- Inventor: David S. Kuo , Xiaomin Yang , ShuaiGang Xiao , Kim Yang Lee , Koichi R. Wago , Thomas Young Chang
- Applicant: SEAGATE TECHNOLOGY LLC
- Applicant Address: US CA Fremont
- Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee Address: US CA Fremont
- Agency: Holzer Patel Drennan
- The original application number of the division: US15886581 2018.02.01
- Main IPC: B81C1/00
- IPC: B81C1/00 ; G01N27/327 ; B01L3/00 ; C12Q1/6809 ; G01N33/487 ; C12Q1/6869 ; B82Y5/00
Abstract:
A DNA sequencing device, and related methods, include a nanopore or nanochannel structure, and a nanoelectrode. The nanoelectrode includes electrode members having free ends exposed within the nanopore or nanochannel structure, an electrode gap defined between of the free ends, and plated portions formed on the free ends to provide a reduced sized for the electrode gap.
Public/Granted literature
- US20200249195A1 FABRICATION OF A NANOCHANNEL FOR DNA SEQUENCING USING ELECTRICAL PLATING TO ACHIEVE ELECTRODE GAP Public/Granted day:2020-08-06
Information query
