HIGH-FLUX EFFICIENCY FILTER FABRICATION USING A FLIP BOND PROCESS WITH SUPPORTIVE STRUCTURE

    公开(公告)号:US20210245109A1

    公开(公告)日:2021-08-12

    申请号:US16924839

    申请日:2020-07-09

    Abstract: A first wafer has a first stop layer deposited on a substrate, the substrate used to form a base support structure. A second wafer has a second stop layer deposited on a sacrificial substrate, and a filter layer deposited on the second stop layer. A rib layer is deposited on one of: the first stop layer of the first layer; or a third stop layer that is deposited over the filter layer. A rib pattern is formed in the rib layer. The first and second wafers are flip bonded such that the rib pattern is joined between the filter layer and the first stop layer. Elongated voids are formed within the filter layer. The base support structure is formed within the substrate of the first wafer such that there is a fluid flow path between the base support structure, the rib layer, and the elongated voids of the filter layer.

    IMPRINT METHOD FOR FABRICATION OF LOW DENSITY NANOPORE MEMBRANE

    公开(公告)号:US20230194991A1

    公开(公告)日:2023-06-22

    申请号:US18062225

    申请日:2022-12-06

    CPC classification number: G03F7/2016 B82Y40/00

    Abstract: A method of manufacturing a synthetic nanopore device for DNA sequencing disclosed herein includes providing a base template, forming a guiding layer on top of the base template, and forming a photoresist layer on top of the guiding layer. The photoresist layer is patterned, and the guiding layer is etched for form a guiding pattern. The photoresist layer is removed to form a guiding template and a self-assembled monolayer is deposited on at least a portion of the guiding template to form a patterned template. The patterned template is exposed to one or more etch processes to form a nanoimprint lithography template. A membrane is imprinted with the nanoimprint lithography template to form an array of nanopores in the membrane.

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