Invention Grant
- Patent Title: Chemical liquid supplying system and method of supplying chemical liquid
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Application No.: US16837507Application Date: 2020-04-01
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Publication No.: US11715656B2Publication Date: 2023-08-01
- Inventor: Yu-Cheng Chang , Keng-Hui Pan , Chieh-Jan Huang , Ming-Lee Lee , Chiang-Jeh Chen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67 ; H01L21/306

Abstract:
In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.
Public/Granted literature
- US20210202285A1 CHEMICAL LIQUID SUPPLYING SYSTEM AND METHOD OF SUPPLYING CHEMICAL LIQUID Public/Granted day:2021-07-01
Information query
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