Invention Grant
- Patent Title: Apparatus for generating extreme ultraviolet light and lithography apparatus including the same
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Application No.: US17409715Application Date: 2021-08-23
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Publication No.: US11720027B2Publication Date: 2023-08-08
- Inventor: Injae Lee , Ohkug Kwon , Sunghyup Kim , Yongchan Kim , Ouiserg Kim , Jeonggil Kim , Junghwan Kim , Hosun Yoo , Daerim Choi , Dongkyeng Han
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR 20200120041 2020.09.17 KR 20210037439 2021.03.23
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20 ; G03F7/00

Abstract:
An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.
Public/Granted literature
- US20220082946A1 APPARATUS FOR GENERATING EXTREME ULTRAVIOLET LIGHT AND LITHOGRAPHY APPARATUS INCLUDING THE SAME Public/Granted day:2022-03-17
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