Invention Grant
- Patent Title: Method and structures pertaining to improved ferroelectric random-access memory (FeRAM)
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Application No.: US17376531Application Date: 2021-07-15
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Publication No.: US11723213B2Publication Date: 2023-08-08
- Inventor: Tzu-Yu Chen , Kuo-Chi Tu , Sheng-Hung Shih , Fu-Chen Chang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H10B53/30
- IPC: H10B53/30 ; H01L49/02

Abstract:
Some embodiments relate to a ferroelectric random access memory (FeRAM) device. The FeRAM device includes a bottom electrode structure and a top electrode overlying the ferroelectric structure. The top electrode has a first width as measured between outermost sidewalls of the top electrode. A ferroelectric structure separates the bottom electrode structure from the top electrode. The ferroelectric structure has a second width as measured between outermost sidewalls of the ferroelectric structure. The second width is greater than the first width such that the ferroelectric structure includes a ledge that reflects a difference between the first width and the second width. A dielectric sidewall spacer structure is disposed on the ledge and covers the outermost sidewalls of the top electrode.
Public/Granted literature
- US20210343731A1 METHOD AND STRUCTURES PERTAINING TO IMPROVED FERROELECTRIC RANDOM-ACCESS MEMORY (FeRAM) Public/Granted day:2021-11-04
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