Invention Grant
- Patent Title: Substrate shape measuring device, substrate handling device, substrate shape measuring unit and method to handle substrates
-
Application No.: US17625467Application Date: 2020-06-08
-
Publication No.: US11726411B2Publication Date: 2023-08-15
- Inventor: Gijs Kramer , Ringo Petrus Cornelis Van Dorst
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NELHERLANDS B.V.
- Current Assignee: ASML NELHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP 185930 2019.07.12
- International Application: PCT/EP2020/065873 2020.06.08
- International Announcement: WO2021/008781A 2021.01.21
- Date entered country: 2022-01-07
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/67 ; G03F7/00

Abstract:
A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.
Public/Granted literature
Information query
IPC分类: