- 专利标题: Bonded structure with interconnect structure
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申请号: US17171351申请日: 2021-02-09
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公开(公告)号: US11728273B2公开(公告)日: 2023-08-15
- 发明人: Belgacem Haba
- 申请人: ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.
- 申请人地址: US CA San Jose
- 专利权人: ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.
- 当前专利权人: ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.
- 当前专利权人地址: US CA San Jose
- 代理机构: Knobbe, Martens, Olson & Bear LLP
- 主分类号: H01L23/538
- IPC分类号: H01L23/538 ; H01L23/00 ; H01L25/065
摘要:
A bonded structure is disclosed. The bonded structure can include an interconnect structure that has a first side and a second side opposite the first side. The bonded structure can also include a first die that is mounted to the first side of the interconnect structure. The first die can be directly bonded to the interconnect structure without an intervening adhesive. The bonded structure can also include a second die that is mounted to the first side of the interconnect structure. The bonded structure can further include an element that is mounted to the second side of the interconnect structure. The first die and the second die are electrically connected by way of at least the interconnect structure and the element.
公开/授权文献
- US20220077063A1 BONDED STRUCTURE WITH INTERCONNECT STRUCTURE 公开/授权日:2022-03-10
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