Invention Grant
- Patent Title: Vapor chamber with support structure and manufacturing method therefor
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Application No.: US17243480Application Date: 2021-04-28
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Publication No.: US11731220B2Publication Date: 2023-08-22
- Inventor: Shih-Lin Huang , Sien Wu , Baoxun He , Ti-Jun Wang
- Applicant: Delta Electronics, Inc.
- Applicant Address: TW Taoyuan
- Assignee: DELTA ELECTRONICS, INC.
- Current Assignee: DELTA ELECTRONICS, INC.
- Current Assignee Address: TW Taoyuan
- Agency: HDLS IPR Servcies
- Agent Chun-Ming Shih
- Priority: CN 1810146134.2 2018.02.12
- Main IPC: B23P15/26
- IPC: B23P15/26 ; F28D15/04 ; F28D15/02 ; B23K26/21 ; B23K101/14 ; F28F19/00 ; F28F21/08

Abstract:
A vapor chamber with a support structure and its manufacturing method are provided. The vapor chamber with the support structure includes a first plate, a second plate spaced apart from the first plate, and multiple support elements fixed between the first and second plates. On an outer surface of any of the first plate or the second plate, laser welding is performed on positions corresponding to the support elements so as to join the support elements to the first and second plates and to form weld ports on the outer surface of any of the plates. The invention solves the problem of fixing the support structure inside the thin vapor chamber, and therefore mass production can be realized.
Public/Granted literature
- US20210247153A1 VAPOR CHAMBER WITH SUPPORT STRUCTURE AND MANUFACTURING METHOD THEREFOR Public/Granted day:2021-08-12
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