- 专利标题: Dielectric-dielectric and metallization bonding via plasma activation and laser-induced heating
-
申请号: US17751090申请日: 2022-05-23
-
公开(公告)号: US11735689B2公开(公告)日: 2023-08-22
- 发明人: Daniel Brodoceanu , Oscar Torrents Abad , Jeb Wu , Zheng Sung Chio , Sharon Nannette Farrens , Ali Sengul , Tennyson Nguty
- 申请人: Facebook Technologies, LLC
- 申请人地址: US CA Menlo Park
- 专利权人: Meta Platforms Technologies, LLC
- 当前专利权人: Meta Platforms Technologies, LLC
- 当前专利权人地址: US CA Menlo Park
- 代理机构: Shook, Hardy & Bacon L.L.P.
- 分案原申请号: US16748689 2020.01.21
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L33/52 ; H01L33/62 ; H01L25/075 ; H01L23/00 ; G02B27/01
摘要:
The invention is directed towards enhanced systems and methods for employing a pulsed photon (or EM energy) source, such as but not limited to a laser, to electrically couple, bond, and/or affix the electrical contacts of a semiconductor device to the electrical contacts of another semiconductor devices. Full or partial rows of LEDs are electrically coupled, bonded, and/or affixed to a backplane of a display device. The LEDs may be μLEDs. The pulsed photon source is employed to irradiate the LEDs with scanning photon pulses. The EM radiation is absorbed by either the surfaces, bulk, substrate, the electrical contacts of the LED, and/or electrical contacts of the backplane to generate thermal energy that induces the bonding between the electrical contacts of the LEDs' electrical contacts and backplane's electrical contacts. The temporal and spatial profiles of the photon pulses, as well as a pulsing frequency and a scanning frequency of the photon source, are selected to control for adverse thermal effects.
公开/授权文献
信息查询
IPC分类: