Invention Grant
- Patent Title: Chemical liquid, chemical liquid storage body, chemical liquid filling method, and chemical liquid storage method
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Application No.: US17740438Application Date: 2022-05-10
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Publication No.: US11740557B2Publication Date: 2023-08-29
- Inventor: Tetsuya Kamimura , Satomi Takahashi
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP 16188273 2016.09.27
- The original application number of the division: US16365016 2019.03.26
- Main IPC: C11D3/16
- IPC: C11D3/16 ; C11D3/20 ; C11D3/43 ; C11D7/22 ; C11D7/26 ; C11D7/50 ; C08F10/06 ; C08F14/26 ; B65D88/06 ; B65D88/08 ; G03F7/32 ; G03F7/16 ; H01L21/027

Abstract:
An object of the present invention is to provide a chemical liquid having excellent developability and excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid storage body, a chemical liquid filling method, and a chemical liquid storage method. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent, a metal impurity, and an organic impurity, in which the metal impurity contains metal atoms, a total content of the metal atoms in the chemical liquid with respect to a total mass of the chemical liquid is equal to or smaller than 50 mass ppt, a total content of the organic impurity in the chemical liquid with respect to the total mass of the chemical liquid is 0.1 to 10,000 mass ppm, the organic impurity contains an alcohol impurity, and a mass ratio of a content of the alcohol impurity to the total content of the organic impurity is 0.0001 to 0.5.
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