Invention Grant
- Patent Title: Apparatus and method for optimized image stitching based on optical flow
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Application No.: US16642894Application Date: 2017-09-27
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Publication No.: US11748952B2Publication Date: 2023-09-05
- Inventor: Feng Yuan , Wei Zong , Juan Zhao , Junkai Wu
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: NICHOLSON DE VOS WEBSTER & ELLIOTT LLP
- International Application: PCT/CN2017/103638 2017.09.27
- International Announcement: WO2019/061066A 2019.04.04
- Date entered country: 2020-02-27
- Main IPC: G06T19/00
- IPC: G06T19/00 ; G06T7/246 ; G06T3/40 ; G06T5/50

Abstract:
An apparatus and method for efficient image optimized image stitching. For example, one embodiment of an apparatus comprises: feature search area identification circuitry/logic to narrow down a feature search area based on possible overlap between two image frames; feature detection circuitry/logic to identify a plurality of feature points in a first image frame of the two image frames; feature matching circuitry/logic to map one or more of the plurality of feature points from the first image frame to corresponding feature points in the right image frame; image frame stitching and blending circuitry/logic to stitch the first image frame and second image frame based on the mapping of the feature points between the two image frames and to blend a portion of the first image frame with a portion of the second image frame.
Public/Granted literature
- US20200349769A1 APPARATUS AND METHOD FOR OPTIMIZED IMAGE STITCHING BASED ON OPTICAL FLOW Public/Granted day:2020-11-05
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