Invention Grant
- Patent Title: Apparatus and methods for controlling concentration of precursors to processing chamber
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Application No.: US16893679Application Date: 2020-06-05
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Publication No.: US11753715B2Publication Date: 2023-09-12
- Inventor: Kenric Choi , William J. Durand
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/448 ; C23C16/455 ; B01F35/20
Abstract:
Apparatus and methods for supplying a vapor to a processing chamber are described. The vapor delivery apparatus comprises an inlet conduit and an outlet conduit, each with two valves, in fluid communication with an ampoule. A bypass conduit connects the inlet conduit and the outlet conduit. A flow restrictive device restricts flow through the outlet conduit.
Public/Granted literature
- US20210381104A1 APPARATUS AND METHODS FOR CONTROLLING CONCENTRATION OF PRECURSORS TO PROCESSING CHAMBER Public/Granted day:2021-12-09
Information query
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