Invention Grant
- Patent Title: Stability of refractory materials in high temperature steam
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Application No.: US16348980Application Date: 2017-11-10
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Publication No.: US11753717B2Publication Date: 2023-09-12
- Inventor: Alan W. Weimer , Amanda Hoskins , Charles Musgrove
- Applicant: The Regents of the University of Colorado
- Applicant Address: US CO Denver
- Assignee: The Regents of the University of Colorado
- Current Assignee: The Regents of the University of Colorado
- Current Assignee Address: US CO Denver
- Agency: Snell & Wilmer L.L.P.
- International Application: PCT/US2017/061021 2017.11.10
- International Announcement: WO2018/089745A 2018.05.17
- Date entered country: 2019-05-10
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/40 ; C23C16/44 ; B81B3/00 ; C04B28/06 ; C04B111/00 ; B32B1/08
Abstract:
The present invention relates, in part, to a discovery of a method for using atomic layer deposition (ALD) to improve the stability of refractory materials in high temperature steam, and compositions produced by the method.
Public/Granted literature
- US20190301015A1 IMPROVED STABILITY OF REFRACTORY MATERIALS IN HIGH TEMPERATURE STEAM Public/Granted day:2019-10-03
Information query
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