Invention Grant
- Patent Title: Substrate holder and method of manufacturing a substrate holder
-
Application No.: US17856520Application Date: 2022-07-01
-
Publication No.: US11754929B2Publication Date: 2023-09-12
- Inventor: Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00 ; B23K26/354 ; B23K26/342 ; B22F10/00 ; B22F10/20 ; B23Q3/18 ; B05D3/06 ; B05D5/00 ; B33Y10/00 ; B33Y80/00 ; B22F7/06 ; B22F10/25 ; B22F10/28 ; B22F10/66
Abstract:
A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.
Public/Granted literature
- US20220331862A1 SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER Public/Granted day:2022-10-20
Information query
IPC分类:
