- 专利标题: Apparatus and method for extended plasma confinement
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申请号: US17841591申请日: 2022-06-15
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公开(公告)号: US11758640B2公开(公告)日: 2023-09-12
- 发明人: Uri Shumlak , Brian A. Nelson , Eric T. Meier
- 申请人: ZAP ENERGY, INC.
- 申请人地址: US WA Seattle
- 专利权人: ZAP ENERGY, INC.
- 当前专利权人: ZAP ENERGY, INC.
- 当前专利权人地址: US WA Seattle
- 代理机构: Davis Wright Tremaine LLP
- 主分类号: H05H1/06
- IPC分类号: H05H1/06 ; G21B1/05 ; G21B1/21 ; H05H1/54
摘要:
Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.
公开/授权文献
- US20220394839A1 APPARATUS AND METHOD FOR EXTENDED PLASMA CONFINEMENT 公开/授权日:2022-12-08
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