Invention Grant
- Patent Title: Sensor apparatus for lithographic measurements
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Application No.: US17251533Application Date: 2019-05-29
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Publication No.: US11761929B2Publication Date: 2023-09-19
- Inventor: Alessandro Polo
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP 178414 2018.06.19
- International Application: PCT/EP2019/064082 2019.05.29
- International Announcement: WO2019/243017A 2019.12.26
- Date entered country: 2020-12-11
- Main IPC: G01N29/07
- IPC: G01N29/07 ; G01N29/22 ; G01N29/24 ; G01N29/28 ; G03F9/00

Abstract:
A sensor apparatus comprising an acoustic assembly arranged to transmit an acoustic signal to a substrate and receive at least part of the acoustic signal after the acoustic signal has interacted with the substrate, a transducer arranged to convert the at least part of the acoustic signal to an electronic signal, and, a processor configured to receive the electronic signal and determine both a topography of at least part of the substrate and a position of a target of the substrate based on the electronic signal. The sensor apparatus may for part of a lithographic apparatus or a metrology apparatus.
Public/Granted literature
- US20210239654A1 Sensor Apparatus for Lithographic Measurements Public/Granted day:2021-08-05
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