Invention Grant
- Patent Title: Lithographic apparatus
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Application No.: US15570934Application Date: 2016-03-29
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Publication No.: US11762304B2Publication Date: 2023-09-19
- Inventor: Güneş Nak{dot over (i)}boğlu , Maarten Holtrust , Martinus Van Duijnhoven , Francis Fahrni , Frank Johannes Jacobus Van Boxtel , Anne Willemijn Bertine Quist , Bart Dinand Paarhuis , Daan Daniel Johannes Antonius Van Sommeren
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP 166563 2015.05.06
- International Application: PCT/EP2016/056758 2016.03.29
- International Announcement: WO2016/177511A 2016.11.10
- Date entered country: 2017-10-31
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00
Abstract:
A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.
Public/Granted literature
- US20180299796A1 LITHOGRAPHIC APPARATUS Public/Granted day:2018-10-18
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