- 专利标题: Copper particle mixture and method for manufacturing same, copper particle mixture dispersion, ink containing copper particle mixture, method for storing copper particle mixture, and method for sintering copper particle mixture
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申请号: US16604046申请日: 2018-04-05
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公开(公告)号: US11767443B2公开(公告)日: 2023-09-26
- 发明人: Hideya Kawasaki
- 申请人: THE SCHOOL CORPORATION KANSAI UNIVERSITY
- 申请人地址: JP Suita
- 专利权人: THE SCHOOL CORPORATION KANSAI UNIVERSITY
- 当前专利权人: THE SCHOOL CORPORATION KANSAI UNIVERSITY
- 当前专利权人地址: JP Suita
- 代理机构: WHDA, LLP
- 优先权: JP 17080971 2017.04.14
- 国际申请: PCT/JP2018/014637 2018.04.05
- 国际公布: WO2018/190246A 2018.10.18
- 进入国家日期: 2019-12-20
- 主分类号: B22F9/24
- IPC分类号: B22F9/24 ; B22F1/054 ; B22F1/0545 ; B22F1/052 ; B22F1/102 ; C09D11/52 ; C09D11/037 ; B22F1/103
摘要:
A copper particle mixture ensures suppression of copper oxidation and high dispersibility, and that can be sintered at a low temperature in a short period of time can suitably be used for a conductive copper ink material. The copper particle mixture contains copper fine particle A and copper nanoparticle B, the copper fine particle A having an average particle diameter of 0.1 μm to 5 μm, and being coated with at least one dicarboxylic acid selected from the group consisting of malonic acid and oxalic acid, the copper nanoparticle B comprising a central portion comprising a copper single crystal, and a protective layer surrounding the central portion, and having an average particle diameter of 1 nm to 100 nm, and the protective layer of the copper nanoparticle B containing at least one member selected from the group consisting of C3-6 primary alcohols, C3-6 secondary alcohols, and derivatives thereof.
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