- Patent Title: Systems and methods for locating sources of fugitive gas emissions
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Application No.: US17684688Application Date: 2022-03-02
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Publication No.: US11768151B2Publication Date: 2023-09-26
- Inventor: J. Brian Leen , Yi-wen Huang
- Applicant: ABB Schweiz AG
- Applicant Address: CH Baden
- Assignee: ABB Schweiz AG
- Current Assignee: ABB Schweiz AG
- Current Assignee Address: CH Baden
- Agency: Armstrong Teasdale LLP
- Main IPC: G01N21/31
- IPC: G01N21/31 ; G01M3/04 ; G01C19/00 ; G01N33/00 ; G01P15/18 ; G01S19/01

Abstract:
A fugitive gas detection system includes an inertial measurement assembly that measures a change in position of the inlet of a gas analyzer and applies a time slip to concentration data detected by an analyzer to generate a time series of the concentration of the gas in three-dimensional space. Applying statistical methods, the relative location of the source of the fugitive gas can be established from the time series. Additionally, in some embodiments, the data may be interpolated to establish a map of a plume of the fugitive gas.
Public/Granted literature
- US20220187199A1 SYSTEMS AND METHODS FOR LOCATING SOURCES OF FUGITIVE GAS EMISSIONS Public/Granted day:2022-06-16
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