Invention Grant
- Patent Title: Method of controlling a position of a first object relative to a second object, control unit, lithographic apparatus and apparatus
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Application No.: US17636765Application Date: 2020-07-24
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Publication No.: US11774865B2Publication Date: 2023-10-03
- Inventor: Thijs Adriaan Cornelis Van Keulen , Hendrikus Herman Marie Cox , Ramidin Izair Kamidi , Willem Herman Gertruda Anna Koenen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP 193366 2019.08.23
- International Application: PCT/EP2020/070979 2020.07.24
- International Announcement: WO2021/037453A 2021.03.04
- Date entered country: 2022-02-18
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00 ; G03F9/00 ; H01L21/68

Abstract:
A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.
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