公开(公告)号：US10120293B2

公开(公告)日：2018-11-06

申请号：US15028676

申请日：2014-09-25

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Ramidin Izair Kamidi ,  Yanin Kasemsinsup

IPC: G03B27/58 ,  G03F7/20 ,  G01B9/02 ,  G01B11/00

Abstract: An object positioning system includes an object; a measurement system to measure the position of the object, wherein each sensor of the measurement system has an associated measurement area on the object and wherein a location of at least one measurement area on the object is dependent on the position of the object; an actuator system to position the object; a control system configured to drive the actuator system, wherein the control system includes an observer with a dynamic model of the object to estimate an internal dynamic behavior of the object, wherein the dynamic model includes the dependency of the location of at least one measurement area on the position of the object, and wherein the control system is configured to drive the actuator system in dependency of an output of the observer.

公开(公告)号：US09927721B2

公开(公告)日：2018-03-27

申请号：US15314440

申请日：2015-05-01

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Nic Jasper Dirkx ,  Ramidin Izair Kamidi ,  Wilhelmus Franciscus Johannes Simons

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F9/7088 ,  G03F9/7092

Abstract: An object positioning system including a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.

公开(公告)号：US09715182B2

公开(公告)日：2017-07-25

申请号：US14647778

申请日：2013-11-25

Applicant: ASML Netherlands B.V.

Inventor： Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Ramidin Izair Kamidi ,  Khalid Manssouri

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70758 ,  G03F7/70783

Abstract: A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.

公开(公告)号：US11774865B2

公开(公告)日：2023-10-03

申请号：US17636765

申请日：2020-07-24

Applicant: ASML Netherlands B.V.

Inventor： Thijs Adriaan Cornelis Van Keulen ,  Hendrikus Herman Marie Cox ,  Ramidin Izair Kamidi ,  Willem Herman Gertruda Anna Koenen

IPC: G03F7/20 ,  G03F7/00 ,  G03F9/00 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70216 ,  G03F9/7003 ,  H01L21/682

Abstract: A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.